ResourceXplorer

Find our technical papers, webinars, articles

The ResourceXplorer enables you to access technical papers, webinars and articles related to analog/mixed-signal semiconductor technologies.



16 entries found



Abstract— The hafnium oxide based FeFET has attracted much attention due to its good scalability, high operating speed, and low power consumption. However, the integration of this device into CMOS technologies faces several challenges. Recently, the 1T1C FeFET concept with one transistor (1T) and a separate ferroelectric capacitor (1C) in the BEoL has been introduced. This new approach can be integrated into standard process technologies without significant changes at the transistor level. Herein, various stacks and integration schemes are investigated to optimize the BEoL MFM module. The impact of these stacks on key performance parameters of the BEoL MFM module, the 1T1C single-bit memory cell, and an 8 kbit test array is discussed.

Hafnium oxide based ferroelectric memory concepts like the FeFET will become increasingly important. They are good scalable, provide high operation speed, and consume low power. Just recently, an 1T1C FeFET concept with one transistor (1T) and one separated ferroelectric capacitor (1C) was demonstrated. This alternative approach is expected to overcome the drawbacks usually observed for the classic 1T concept like limited endurance, reduced retention, and high device-to-device variability. Electrically, the 1T1C FeFET consists of a series connection of the ferroelectric capacitor and the gate oxide capacitance. To operate at low voltages, a large fraction of the applied voltage must drop across the ferroelectric, which can be archived by optimizing the capacitance ratio. Herein, 1T1C
FeFETs with various capacitance ratios are fabricated and its impact on the electrical performance is discussed. Furthermore, the observed endurance of up to 108 field cycles illustrates the
great potential of the new concept.

In our work we describe and demonstrate an alternative approach of integrating 1T-1C FeFET having separated transistor (1T) without modifying frontend CMOS technology and an additional gate-coupled ferroelectric (FE) capacitor (1C) embedded in the interconnect layers. Starting from the results of FE capacitor integration and 1T-1C single cell characterization this paper describes realization and results of a fully integrated 8 kbit memory array implementation.

Whether you want to get a general overview of X-FAB’s large NVM portfolio, or already know the specific functionality, operating conditions and reliability requirements for your project, X-FAB provides an exhaustive and straightforward way to access relevant information.

This short video introduces the available tools for the quick access to helpful information about X-FAB’s NVM portfolio.

At X-FAB, we put great emphasis on reliability: all our technology platforms must comply with the tough requirements of the automotive industry, and our embedded NVM are no exception to that.

The whole test process for embedded NVM IP, from Design for Test (DFT) to qualification and production screening must be designed upfront and carefully executed to fulfill the automotive quality requirements.

This presentation provides a first overview and some key examples about the challenges and specific approaches in ensuring best-in-class quality for every single NVM IP from X-FAB and how customers can benefit from it.

I. Introduction
II. NVM Technology & Design
III. NVM Product Integration & Application

Everyone agrees that developing an IC is a challenging process with multiple trade-offs. You have to balance performance, size and cost requirements to decide how best to integrate customized memories. It’s fairly straightforward for ROM and RAM volatile memories because of well-established compiler solutions. But non-volatile memories (NVM) for trimming, data storage and programming require special consideration. X-FAB makes customizing complex embedded NVM solutions (such as EEPROM, OTP and NVSRAM) fast, easy and with minimal risks for errors. This webinar includes a live demo of an NVM compiler for NVRAM often used for data storage. You’ll see how easy and fast it is to customize your memory block design using the front-end design data (black box layout, a simulation model, a datasheet and a test specification) you receive from X-FAB within minutes via e-mail.
This Inter-poly Oxide-Nitride-Oxide (ONO) dielectric film has been widely used as dielectric films in stacked gate Flash memory devices. The ONO dielectric film plays an important role in ensuring good reliability in flash memory devices. In this paper, the characteristics of ONO dielectric films have been analyzed.
In this paper, optimization and physical scaling of the SONOS ONO triple layer are extensively evaluated, with detailed characterization of the Flash cell behavior. Reliability tests have demonstrated high temperature endurance and long-term data retention. The results have shown that the reliability requirement is attainable even with down scaling of the vertical component of the oxynitride charge trapping layer, which makes it feasible to operate the cell at a lower programming voltage.
X-FAB, a pure play foundry, has already extensive experience in volume production of monolithic integrated MEMS devices. The idea of combining CMOS and MEMS processes to obtain monolithic integrated sensor solutions is a logical, consequent step following the “More than Moore” strategy.