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Technology Overview
FeatureXplorer
CMOS
BiCMOS
SOI
MEMS
MEMS Technologies
Customer Specific
Bulk Micromachining
Surface Micromachining
Absolute pressure sensors
Inertial sensors
CMOS MEMS
MEMS Facility
Design Support
CUSP
Feature Technologies
X-FAB platform technology XM-SC for inertial sensors (acceleration, angular rate)
Main process features:
SOI substrate
Deep Reactive Ion Etching (DRIE)
Isotropic Silicon Etching
HF Vapour Etching
Wafer level packaging using glass frit bond
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