87 entries, filtered by: CMOS
Published: April 2011

The XT06 Series completes X-FAB's 0.6 Micron Modular Mixed Signal Technology.
XT06 uses dielectric isolation on SOI wafers. This allows unrestricted 60 V high and low side operation of all devices. The process offers reduced parasitics which results in smaller crosstalk, reduced noise and better EMC characteristics. Thus XT06 allows innovative circuit design with reduced circuit complexity. CMOS as well as Bipolar Transistors are available with breakdown voltages up to 110V.
The 5 V CMOS core is compatible in design rules and transistor performance with state of the art 0.6μm CMOS processes.
For analog applications several capacitor and resistor devices are realized, using the double-poly architecture.


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Published: April 2011

Silicon photodiode integrated with CMOS has been in extensive study for the past ten years due to its wide use in applications such as short-distance communication, VCD players, ambient light sensors and many other intelligent systems. In recent years, high speed blue-ray DVD is replacing conventional DVD due to its larger storage capacity and higher speed. In this work, the photodiode optimized for blue ray is fully integrated with standard 0.35um CMOS process and the bandwidth dependency upon thermal process and epitaxial material is investigated.


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Published: March 2011

A study has been carried out to improve metal-insulator-metal (MIM) capacitor's capacitance density and linearity performance. The scopes of the study included single MiM and stack MIM structures. Different dielectric schemes were evaluated with their corresponding capacitance density, breakdown voltages and linearity coefficient to voltage and temperature variation etc. characterised.


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Published: March 2011

Drastically device dimension shrinkage and rigorous requirement in automotive era puts Negative Bias Temperature Instability (NBTI) at the forefront of reliability issue recently. The PMOS parametric degradation during negative bias high temperature aging can depend on many process variables of the manufacturing flow. A study was carried out to explore the process related dependencies for high voltage PMOS transistor and to increase the device robustness against NBTI stress. In this papers, the process impact on the NBTI degradation were discussed. This investigation work provides methods for significant suppression of the NBTI degradation with silicon rich oxide (SRO) inter layer dielectric (ILD) liner and two-step gate oxidation.


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Published: March 2011

Reliability is a critical performance factor for semiconductor technologies. This webinar describes the physical phenomena that can lead to device degradation during circuit operation, and deduces reliability models for CMOS technologies. These models can be used for design optimization (“Design for Reliability”) to enable very robust products, and for reliability risk assessment for advanced operating conditions such as high temperature and high voltage.


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Published: February 2011

The CX08 Series is X-FAB‘s 0.8 Micron Modular Mixed Signal Technology. Main target applications are standard cell, semi-custom and full custom designs for Industrial, Telecommunication and Automotive products - including the 42V board net.
Based on a state of the art single poly double metal 0.8-micron drawn gate length N-well process for digital application, various process modules are available for high performance analogue and high voltage circuits.


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Published: January 2011

Visualization is still the most important tool in medical diagnostics to allow for the physician, in combination with their medical knowledge, to detect diseases within the human body and choose healing treatments in order to enable recovery. For minimal invasive surgical operations that use endoscopic tools, imaging camera modules that have both a small volume and a good resolution are necessary to ensure the success of the surgical treatment.
Microsystem technologies now allow for the direct integration of imaging optics and sensors in a system.


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Published: January 2011

Miniaturized video endoscopes with an imager located at the distal end and a simplified opto-mechanical layout are presented. They are based on a CMOS imager with 650 x 650 pixels of 2.8 μm pitch and provide straight view with 75° and 110° field of view at f/4.3. They have an outer diameter of 3 mm including the shell and a length of approx. 8 mm. The optics consist of polymer lenses in combination with a GRIN and a dispensed lens. Using a simple flip chip assembly, optical axis alignment better than 10 μm and a contrast of 30 % at 90 LP/mm was achieved. The 75° FOV system was sealed at the front window using a solderjetting technology, providing 10-9 mbar*l/s leakage rates even after several autoclave cycles.


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Published: December 2010

This free webinar introduces X-FAB’s Hall effect sensor device that detects and measures magnetic fields directly on the chip, making magnetic field-sensing design much faster. You’ll learn how the Hall sensor element – available as a completely characterized building block in X-FAB’s 0.18 micrometer modular high-voltage technology, XH018 – can be combined with other features of the XH018 process to enable a broad range of applications. For example, contactless detection or measurement of magnetic fields, and applications in which a magnetic field is used for indirect measurement of distance, position, rotational angle, speed or an electric current.


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Published: December 2010

The CX06 Series is X-FAB‘s 0.6 Micron Modular Mixed Signal Technology. Main target applications are standard cell, semi-custom and full custom designs for Industrial, Automotive and Telecommunication products.
Based on a state of the art single poly double metal 0.6-micron drawn gate length N-well process for digital application, process modules are available for triple metal and double poly high performance analogue circuits.


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