Open Platform Technology XM-BP for Relative Pressure Sensors

Main process features:

  • KOH etch with electrochemical etch stop for discrete version
  • Time-controlled KOH etch for monolithic integrated version
  • Implanted piezoresistors
  • Fully characterized sensor IP blocks available for pressure ranges up to 0.5 bar, 1 bar, 6 bar, 10 bar and 15 bar (see infosheet)
  • customer specific pressure sensors available on request
  • Integrated version: available as MEMS module for integration with X-FAB CMOS technology XC10 (see infosheet)