16 entries, filtered by: Opto
Published: April 2010

The exponential growth of opto-electronic applications such as digital cameras and mobile phones during the past few years has followed the same Moore’s Law scenario as memories and digital gates did in the past. These low-cost, high-volume applications require highly specialized fabs and processes to achieve the lower node size that allows for higher pixel count and higher resolution. Moore’s Law works very well for these high-volume applications. However, it falls short for several other applications that require the integration of various opto-sensitive components. These applications might have varying technical requirements for sensitivity, supported wavelength, noise and bandwidth; and commercial volume requirements spanning from low to high. In addition, many Silicon on Chip (SoC) solutions also require multiple analog functions, including opto-electronic sensors. Highly specialized fabs that follow Moore’s Law simply lack the flexibility to support all of these different requirements.


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Published: January 2010

Get an overview of the optical functions and features available as part of X-FABs More-than-Moore technology offering, including the impacts on spectral sensitivity, signal bandwidth, and noise margins. Explore what you need to consider when starting to design your optical product.


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Published: August 2009

OLED-on-CMOS micro-displays are widely studied in the recent years due to the fast development of OLED. However, there are some challenges to fabricate the electrodes of OLED. In this study, the process challenges are discussed, and the surface roughness is suggested to be one of the critical parameters.


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Published: August 2009

Monolithically integrated photodiodes with high spectral responsivity over the entire visible and the near infrared spectral range are of growing interest for the semiconductor industry, since the next generation of optical data storage devices (Blue DVD) will soon be brought to market. In this paper, the bandwidth of photodiode dependence on the junction implant conditions and thermal budget was simulated by TCAD. It shows significant dependence on these process conditions. The corresponding mechanism related to RC delay, relationship between depletion region and light absorption will be discussed in detail with the help of simulation pictures and simple model explanation.


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Published: April 2002

We attain a PIN photodiode combining high responsivity, fast response and low capacitance in BiCMOS technology. Only a slight process modification, having no verifiable influence on the transistor parameters is necessary. We achieve bandwidths of 625MHz and 240MHz at 670 and 780nm as well as a quantum efficiency of 96.5%.


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Published: February 2002

Result of a large-area, low-capacitance lateral p-i-n photodiode in silicon-on-insulator (SOI) are presented. This photodiode possesses an antireflection coating optimized for blue light and is therefore appropriate for scintillation detector applications. An average external quantum efficiency of 78.6% and 68.4% is achieved for λ = 430 nm and 400 nm, respectively.


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